Microwave Plasma CVD equipment

It serves as the core precision deposition and growth equipment for high-purity single crystal diamond, NV color center quantum diamond, optical-grade diamond, and semiconductor diamond thin films. Adopting the industrial-standard 2.45 GHz microwave excitation method, the system generates high-density, large-volume, electrodeless and contamination-free stable plasma within a vacuum chamber, enabling the cracking and controlled deposition of gases such as methane and hydrogen. This allows for the precise fabrication of ultra-low-impurity single crystal diamond substrates, NV quantum color center crystals with controllable concentration, and highly flat optical diamond thin films.
Compared with conventional thermal CVD and DC plasma CVD equipment, MPCVD features key advantages including electrodeless contamination, high plasma uniformity, extremely low growth stress, controllable defect density, and strong process stability. It supports long-term continuous and stable operation, perfectly meeting the mass production and R&D customization requirements of quantum diamond, optical crystals, high-power laser crystals, and semiconductor thermal management diamond. As such, it is a core piece of equipment in the advanced diamond materials industry.